FTS UK public procurement

Tender for FTIR monitoring solution for DRE in semiconductor gaseous abatement systems

Swansea University

ActiveOCDS ID ocds-h6vhtk-078c93
Tender value£150,0000 awards · 0 contracts

01 Procurement

Tender overview

Updated 21 October 2026
Buyer
Swansea University
Status
Active
Procurement method
Below threshold - open competition
Category
goods
CPV classification
Not supplied
Tender period
Not supplied — 9 November 2026

Description

The Faculty of Science and Engineering at Swansea University is seeking to procure a complete, turnkey FTIR-based system for determining Destruction or Removal Efficiency (DRE) of semiconductor point-of-use abatement systems. This equipment will be housed in the Centre for Integrative Semiconductor Materials (CISM) at Swansea Universities Bay Campus. The existing abatement system installed in CISM, is currently unmonitored in terms of DRE, and a there is an urgent requirement to have continuous DRE monitoring to inform both process and abatement experiments and drive efficiency improvements. Additionally, a new abatement system is being installed, and DRE will be compared between the new and existing systems using the new FTIR capability. External funding is being sought from the Welsh Governments SMART Capital scheme for a fixed maximum budget of GBP 150,000 excluding VAT which includes all delivery and service contract costs. This investment will support multiple active grants and is essential for both submitted and planned research proposals. Due to the funding programme's tight expenditure deadline, this tender has been published in advance of the funding decision. Any contract award resulting from this tender will be conditional upon the funding being approved and awarded.

i

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02 Awards and contracts

Published award records

0 shown

No award object is present in this compiled process yet.

03 Organisations

Buyers, suppliers and other parties

1 parties
Buyer

Swansea University

Procurement, Finance Dept., Swansea, UKL18, SA2 8PP, United Kingdom

GB-PPON PTNV-7472-GRTW

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04 Provenance

Source for this process

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